Citation: | Junggil KIM, Yunjung KIM, Sangjin KIM, Guangsup CHO. Silicone-coated polyimide films deposited by surface dielectric barrier discharges[J]. Plasma Science and Technology, 2019, 21(1): 15506-015506. DOI: 10.1088/2058-6272/aae477 |
[1] |
Fridman G et al 2008 Plasma Process. Polym. 5 503
|
[2] |
Heinlin J et al 2010 J. Dtsch. Dermatol. Ges. 8 968
|
[3] |
Foster K W et al 2008 J. Cosmet. Dermatol. 7 169
|
[4] |
Tiede R et al 2014 Contrib. Plasma Phys. 54 118
|
[5] |
Heinlin J et al 2011 J. Eur. Acad. Dermatol. Venereol. 25 1
|
[6] |
Bogle M A et al 2007 Arch. Dermatol. 143 168
|
[7] |
Pan J et al 2010 IEEE Trans. Plasma Sci. 38 3143
|
[8] |
Lu X P et al 2009 IEEE Trans. Plasma Sci. 37 668
|
[9] |
Lee H et al 2009 J. Endod. 35 587
|
[10] |
Sun P et al 2010 IEEE Trans. Plasma Sci. 38 1892
|
[11] |
Schutze A et al 1998 IEEE Trans. Plasma Sci. 26 1685
|
[12] |
Kolb J F et al 2008 Appl. Phys. Lett. 92 241501
|
[13] |
Weltmann K D et al 2009 Contrib. Plasma Phys. 49 631
|
[14] |
Daeschlein G et al 2010 Plasma Process. Polym. 7 224
|
[15] |
Fridman G et al 2006 Plasma Chem. Plasma Process. 26 425
|
[16] |
Fridman G et al 2007 Plasma Chem. Plasma Process. 27 163
|
[17] |
Kim Y et al 2015 IEEE Trans. Plasma Sci. 43 944
|
[18] |
Kim Y et al 2016 Wearable plasma-pads for healthcare applications: plasma patch, plasma bandage, plasma socks, and plasma cap 2016 IEEE Int. Conf. on Plasma Science (ICOPS) (Banff, AB: IEEE) (https://doi.org/10.1109/ PLASMA.2016.7534289)
|
[19] |
Kim J et al 2017 Appl. Sci. 7 1308
|
[20] |
Liaw D J et al 2012 Prog. Polym. Sci. 37 907
|
[21] |
ShinEtsu Silicone JP RTV Silicone Rubbers for Electrical & Electronic Applications http://shinetsusilicone-global.com/ catalog/pdf/rtv_ele_e.pdf
|
[22] |
Homola T et al 2017 Plasma Chem. Plasma Process. 37 1149
|
[23] |
Cho G et al 2004 J. Phys. D: Appl. Phys. 37 2863
|
[24] |
Cho G et al 2007 J. Appl. Phys. 102 113307
|
[25] |
Reitz J R, Milford F J and Christy R W 2008 Foundations of Electromagnetic Theory 4th edn (Boston: Addison-Wesley)
|
[26] |
Chapman B 1980 Glow Discharge Processes: Sputtering and Plasma Etching (New York: Wiley)
|
[27] |
Lazukin A V et al 2017 J. Phys.: Conf. Ser. 927 012028
|
[28] |
Sokolova M V et al 2013 Eur. Phys. J. Appl. Phys. 61 24312
|
[29] |
Amirov R H et al 2009 Int. J. Plasma Environ. Sci. Technol. 3 35
|
[30] |
Gibalov V I et al 2012 Plasma Sources Sci. Technol. 21 24010
|
[31] |
Kogelschatz U 2003 Plasma Chem. Plasma Process 23 1
|
[32] |
Wagner H E et al 2003 Vacuum 71 417
|
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