Experimental Determination of the ICRF Power Depositing on the Electrons in HT-7

BU Jingliang (布景亮); LIU Yong (刘永); ZHANG Xinjun (张新军); TI Ang (提昂); et al.

doi:10.1088/1009-0630/15/11/04

Plasma Science and Technology > 2013 > 15(11): 1100-1102. > DOI: 10.1088/1009-0630/15/11/04

BU Jingliang (布景亮), LIU Yong (刘永), ZHANG Xinjun (张新军), TI Ang (提昂), et al.. Experimental Determination of the ICRF Power Depositing on the Electrons in HT-7[J]. Plasma Science and Technology, 2013, 15(11): 1100-1102. DOI: 10.1088/1009-0630/15/11/04

Citation:

PDF (2179 KB)

Experimental Determination of the ICRF Power Depositing on the Electrons in HT-7

Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China

Funds: supported by the National Magnetic Confinement Fusion Science Program of China (Nos.2011GB107000, 2011GB107003), and partly supported by the JSPS-NRF-NSFC A3 Foresight Program in the field of Plasma Physics (NSFC No.11261140328) and National Natural Science Foundation of China (Nos.11105179, 11021565, 11275234)

More Information

Received Date: November 04, 2012

Graphical Abstract

Abstract

Abstract

This paper reports for the first time an experimental study on the power deposition profile of the ion cyclotron range frequencies (ICRF) power depositing on electrons in HT-7. The fast Fourier transform (FFT) analysis and the break in slope (BIS) method are utilized to obtain the information of the power deposition. The results indicate that the electrons were heated directly, and the electrons absorbed around 20% of the input power of the discharge of interest.
- ICRF,
- power modulation,
- BIS

FullText(HTML)

References (0)

[1]	Kang AN, Shuai ZHANG, Siwu SHAO, Jinlong LIU, Junjun WEI, Liangxian CHEN, Yuting ZHENG, Qing LIU, Chengming LI. Effects of the electric field at the edge of a substrate to deposit a Ø100 mm uniform diamond film in a 2.45 GHz MPCVD system[J]. Plasma Science and Technology, 2022, 24(4): 045502. DOI: 10.1088/2058-6272/ac4deb
[2]	Ming SUN (孙明), Zhan TAO (陶瞻), Zhipeng ZHU (朱志鹏), Dong WANG (王东), Wenjun PAN (潘文军). Spectroscopic diagnosis of plasma in atmospheric pressure negative pulsed gas-liquid discharge with nozzle-cylinder electrode[J]. Plasma Science and Technology, 2018, 20(5): 54005-054005. DOI: 10.1088/2058-6272/aab601
[3]	LAN Hui (兰慧), WANG Xinbing (王新兵), ZUO Duluo (左都罗). Time-Resolved Optical Emission Spectroscopy Diagnosis of CO₂ Laser-Produced SnO₂ Plasma[J]. Plasma Science and Technology, 2016, 18(9): 902-906. DOI: 10.1088/1009-0630/18/9/05
[4]	WU Zhonghang(吴忠航), LI Zebin(李泽斌), JU Jiaqi(居家奇), HE Kongduo(何孔多), YANG Xilu(杨曦露), YAN Hang(颜航), CHEN Zhenliu(陈枕流), OU Qiongrong(区琼荣), LIANG Rongqing(梁荣庆). Experimental Investigation of Surface Wave Plasma Excited by a Cylindrical Dielectric Rod[J]. Plasma Science and Technology, 2014, 16(2): 118-122. DOI: 10.1088/1009-0630/16/2/06
[5]	WANG Huan(王欢), YANG Lizhen(杨丽珍), CHEN Qiang(陈强). Investigation of Microwave Surface-Wave Plasma Deposited SiO_x Coatings on Polymeric Substrates[J]. Plasma Science and Technology, 2014, 16(1): 37-40. DOI: 10.1088/1009-0630/16/1/08
[6]	FU Wenjie (傅文杰), YAN Yang (鄢扬). Analysis of High-Power Microwave Propagation in a Magnetized Plasma Filled Waveguide[J]. Plasma Science and Technology, 2013, 15(10): 974-978. DOI: 10.1088/1009-0630/15/10/03
[7]	LI Cong (李聪), ZHANG Jialiang (张家良), YAO Zhi (姚志), WU Xingwei (吴兴伟), et al.. Diagnosis of Electron, Vibrational and Rotational Temperatures in an Ar/N ₂ Shock Plasma Jet Produced by a Low Pressure DC Cascade Arc Discharge[J]. Plasma Science and Technology, 2013, 15(9): 875-880. DOI: 10.1088/1009-0630/15/9/08
[8]	LU Wenqi (陆文琪), JIANG Xiangzhan (蒋相站), LIU Yongxin (刘永新), YANG Shuo (杨烁), et al. Improved Double-Probe Technique for Spatially Resolved Diagnosis of Dual-Frequency Capacitive Plasmas[J]. Plasma Science and Technology, 2013, 15(6): 511-515. DOI: 10.1088/1009-0630/15/6/05
[9]	CHEN Zhaoquan (陈兆权), LIU Minghai (刘明海), HU Yelin (胡业林), ZHENG Xiaoliang (郑晓亮), LI Ping (李平), XIA Guangqing (夏广庆). Character Diagnosis for Surface-Wave Plasmas Excited by Surface Plasmon Polaritons[J]. Plasma Science and Technology, 2012, 14(8): 754-758. DOI: 10.1088/1009-0630/14/8/13
[10]	PANG Jianhua (庞见华), LU Wenqi (陆文琪), XIN Yu (辛煜), WANG Hanghang (王行行), HE Jia (贺佳), XU Jun (徐军). Plasma Diagnosis for Microwave ECR Plasma Enhanced Sputtering Deposition of DLC Films[J]. Plasma Science and Technology, 2012, 14(2): 172-176. DOI: 10.1088/1009-0630/14/2/17