Improvement of the Harmonic Technique of Probe for Measurements of Electron Temperature and Ion Density

BAI Yujing (白玉静); LI Jianquan (李建泉); XU Jun (徐军); LU Wenqi (陆文琪); WANG Younian (王友年); DING Wanyu (丁万昱 )

doi:10.1088/1009-0630/18/1/10

Plasma Science and Technology > 2016 > 18(1): 58-61. > DOI: 10.1088/1009-0630/18/1/10

BAI Yujing (白玉静), LI Jianquan (李建泉), XU Jun (徐军), LU Wenqi (陆文琪), WANG Younian (王友年), DING Wanyu (丁万昱 ). Improvement of the Harmonic Technique of Probe for Measurements of Electron Temperature and Ion Density[J]. Plasma Science and Technology, 2016, 18(1): 58-61. DOI: 10.1088/1009-0630/18/1/10

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Improvement of the Harmonic Technique of Probe for Measurements of Electron Temperature and Ion Density

1Key Laboratory of Materials Modi?cation by Laser, Ion and Electron Beams (Dalian University of Technology), Ministry of Education, Dalian 116024, China 2School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China 3School of Materials Science and Engineering, Dalian Jiaotong University, Dalian 116028, China

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Received Date: August 24, 2015

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Abstract

Abstract

Conventional Langmuir probe techniques usually face the difficulty of being used in processing plasmas where dielectric compounds form, due to rapid failure by surface insulation. A solution to the problem, the so-called harmonic probe technique, had been proposed and shown effectiveness. In this study, the technique was investigated in detail by changing bias signal amplitudes V₀, and evaluated its accuracy by comparing with the conventional Langmuir probe. It was found that the measured electron temperature T_e increased with V₀, but showing a relatively stable region when V₀ >T_e/e in which it was close to the true T_evalue. This is contrary to the general consideration that V₀ should be smaller than T_e/e for accurate measurement of T_e. The phenomenon is interpreted by the non-negligible change of the ion current with V₀ at low V₀ values. On the other hand, the measured ni also increased with V₀ due to the sheath expansion, and to improve the accuracy of n_iit needs to linearly extrapolate the n_i-V₀trend to V₀=0. The results were applied to a diagnosis of the plasmas for chemical vapor deposition of diamond-like carbon thin films and the relationship between plasma parameters and films deposition rates was obtained.
- plasma diagnosis,
- Langmuir probe,
- harmonics,
- insulative deposition

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