1 Michael G Kong, Liu Dingxin. 2014, High Voltage Engineering, 40: 2956 (in Chinese) 2 Samukawa S, Hori M, Rauf S, et al. 2014, J. Phys. D:Appl. Phys., 45: 253001 3 Peter Bruggeman, Christophe Leys. 2009, J. Phys. D:Appl. Phys., 42: 053001 4 Lu Xinpei, Yan Ping, Ren Chunsheng, et al. 2011, Sci.Sin-Phys. Mech. Astron., 41: 801 (in Chinese) 5 Tijani Jimoh O, Fatoba Ojo O, Madzivire Godfrey, et al.2014, Water Air Soil Pollut., 225: 2102 6 Mart′?nková L, Uhn′aková B, P′atek M, et al. 2009, Environ. Int., 35: 162 7 Pˇarariua C, Mihoc G, Popa A, et al. 2013, Chem. Eng.J., 222: 218 8 Han Y X, Boateng A A, Qi P X, et al. 2013, J. Environ.Manage., 118: 196 9 Jiang Nan, Lu Na, Shang Kefeng, et al. 2013, J. Hazard.Mater., 262: 387 10 Chen Bingyan, Zhu Changping, Chen Longwei, et al.2014, Plasma Sci. Technol., 16: 1126 11 Haddouche A, Lemerini M. 2015, Plasma Sci. Technol.,17: 589 12 Malik Muhammad Arif. 2010, Plasma Chem. Plasma Process., 30: 21 13 Wu Haixia, Fang Zhi, Xu Yanhua. 2015, Plasma Sci.Technol., 17: 228 14 Horikoshi Satoshi, Serpone Nick. 2014, Molecules, 19:18102 15 Zhu Lu, He Zhenghao, Li Pei, et al. 2013, J. Electrostat.,71: 728 16 Li Shengli, Hu Sheng, Zhang Han. 2012, IEEE Trans.Plasma Sci., 40: 63 17 Lin Qifu, Ni Guohua, Jiang Yiman, et al. 2014, Plasma Sci. Technol., 16: 1036 18 Lu Na, Feng Yingchun, Li Jie, et al. 2015, IEEE Trans.Plasma Sci., 43: 580 19 Jiang Song, Wen Yiyong, Liu Kefu. 2014, Plasma Sci.Technol., 16: 59 20 Pokryvailo Alex, Wolf Michael, Yankelevich Yefim, et al.2006, IEEE Trans. Plasma Sci., 34: 1731 21 Vanraes Patrick, Willems Gert, Daels Nele, et al. 2015,Water Res., 72: 361 22 Stratton G R, Bellona C L, Dai F, et al. 2015, Chem.Eng. J., 273: 543 23 Abia Daouda, Nzali Serge, Acayanka Elie, et al. 2015,J. Ind. Eng. Chem., 29: 156 24 Gu Ling. 2014, Plasma Sci. Technol., 16: 223 25 Zhou C H, Cheng S B, Sun J L, et al. 2009, J. Phys.Chem. A, 113: 4923 26 Wang Xiaoping, Li Zhongjian, Zhang Xingwang, et al.2014, Plasma Sci. Technol., 16: 479 27 Azooz A A and Waysi Sabah I. 2014, Plasma Sci. Technol., 16: 211 28 Yu Jianyang, Liu Huaping, Xu Dimeng, et al. 2014,Plasma Sci. Technol., 16: 197 29 Wandell Robert J, Locke Bruce R. 2014, IEEE Trans.Plasma Sci., 42: 2634 30 Kim Kil-Seong, Gam Sang Gyu, Mok Young Sun. 2015,Chem. Eng. J., 271: 31 31 Andreas S, James Y J, Steven E B, et al. 1998, IEEE Trans. Plasma Sci., 26: 1685 32 Ko C H, Fan C, Chiang P N, et al. 2013, J. Hazard.Mater., 149: 275 33 Charles de Izarra. 2000, J. Phys. D: Appl. Phys., 33:1697 34 Yang Q S, Jiang Z L, Peng Z M, et al. 2011, Acta Phys.Sin., 60: 053302 (in Chinese) 35 Li X Y, Lin Z X, Liu Y Y, et al. 2004, Acta Optical Sin.,24: 1051 36 Jiang Pengchao, Wang Wenchun, Zhang Shuai, et al.2014, Spectrochim. Acta A, 122: 107 37 Liu Kefu, Zhao Haiyang, Qiu Jian. 2009, High Voltage Engineering, 35: 12 (in Chinese) 38 Chen Longwei, Yu Wei, Xiao Zuo, et al. 2012, Thin Solid Films, 521: 226 39 Penetrante B M, Hsiao M C, Bardsley J N, et al. 1997,Plasma Sources Sci. Technol., 6: 251 40 Tas Marnix A, Hardeveld R, Veldhuizen E M. 1997,Plasma Chem. Plasma Process., 17: 371 41 Shih K Y, Bruce R. 2011, IEEE Trans. Plasma Sci., 39:883 42 Oba Y, Watanabe N, Kouchi A, et al. 2011, Phys. Chem.Chem. Phys., 13: 15792 43 Casasanta G., Sarra A, Meloni D, et al. 2011, Atmos.Environ., 45: 3937 44 Pfister G, Baumgartner D, Maderbacher R, et al. 2000,Atmos. Environ., 34: 4019 45 Li Xuechen, Zhao Na, Fang Tongzhen, et al. 2008,Plasma Sources Sci. Technol., 17: 015017 46 Ha Yan, Wang Huijuan, Wang Xiaofei. 2012, Phys. Plasmas, 19: 012308 47 Dai D, Hou H X, Hao Y P. 2011, Appl. Phys. Lett., 98:131503 48 Bagheri Mehdi, Mohseni Madjid. 2014, Chem. Eng. J.,256: 51 49 Ho Leong Chuan, Babu Ponnivalavan, Kumar Rajnish,et al. 2013, Energy, 63: 252 50 Takita Kenichi, Abe Naoyuki, Masuya Goro, et al. 2007,Proc. Combust. Inst., 31: 2489 51 Chen Junhong, Wang Pengxiang. 2005, IEEE Trans.Plasma Sci., 33: 808 52 Crutzen P J. 1979, Ann. Rev. Earth Planet. Sci., 7: 443 53 Nissenson P, Dabdub D, Das R, et al. 2010, Atmos. Environ., 44: 4859 54 Dubowski Yael, Colussi A J, Hoffmann M R. 2001, J.Phys. Chem. A, 105: 4928 55 Zoschke Kristin, B¨ ornick Hilmar, Worch Eckhard. 2014,Water Res., 52: 131 56 George V B, Greenstock C L, Helman W P, et al. 1988,J. Phys. Chem. Ref. Data, 17: 513
|