Dynamic performance of the ITER reactive power compensation system

SHENG Zhicai(Cheng-Zhi-Cai-); FU Peng (Fu-Feng-); XU Xiuwei (Hu-Liu-Wei-)

Plasma Science and Technology > 2011 > 13(5): 637-640.

SHENG Zhicai(Cheng-Zhi-Cai-), FU Peng (Fu-Feng-), XU Xiuwei (Hu-Liu-Wei-). Dynamic performance of the ITER reactive power compensation system[J]. Plasma Science and Technology, 2011, 13(5): 637-640.

Citation:

PDF (206 KB)

Dynamic performance of the ITER reactive power compensation system

Institute of Plasma Physics, CAS, Hefei 230031, China

More Information

Received Date: November 09, 2010

Graphical Abstract

Abstract

Abstract

Dynamic performance of a reactive power compensation (RPC) system for the International Thermonuclear Experimental Reactor (ITER) power supply is presented. Static var compensators (SVCs) are adopted to mitigate voltage fluctuation and reduce the reactive power down to a level acceptable for the French/European 400 kV grid. A voltage feedback and load power feedforward controller for SVC is proposed, with the feedforward loop intended to guarantee short response time and the feedback loop ensuring good dynamics and steady characteristics of SVC. A mean filter was chosen to measure the control signals to improve the dynamic response. The dynamic performance of the SVC is verified by simulations using PSCAD/EMTDC codes.
- SVC,
- feedforward,
- mean filter,
- dynamic performance

FullText(HTML)

References (0)

[1]	Min ZHU (朱敏), Chao YE (叶超), Xiangying WANG (王响英), Amin JIANG (蒋阿敏), Su ZHANG (张苏). Effect of radio-frequency substrate bias on ion properties and sputtering behavior of 2 MHz magnetron sputtering[J]. Plasma Science and Technology, 2019, 21(1): 15507-015507. DOI: 10.1088/2058-6272/aae7dd
[2]	Amin JIANG (蒋阿敏), Chao YE (叶超), Xiangying WANG (王响英), Min ZHU (朱敏), Su ZHANG (张苏). Ion property and electrical characteristics of 60 MHz very-high-frequency magnetron discharge at low pressure[J]. Plasma Science and Technology, 2018, 20(10): 105401. DOI: 10.1088/2058-6272/aad379
[3]	Kang AN (安康), Liangxian CHEN (陈良贤), Jinlong LIU (刘金龙), Yun ZHAO (赵云), Xiongbo YAN (闫雄伯), Chenyi HUA (化称意), Jianchao GUO (郭建超), Junjun WEI (魏俊俊), Lifu HEI (黑立富), Chengming LI (李成明), Fanxiu LU (吕反修). The effect of substrate holder size on the electric field and discharge plasma on diamond-film formation at high deposition rates during MPCVD[J]. Plasma Science and Technology, 2017, 19(9): 95505-095505. DOI: 10.1088/2058-6272/aa7458
[4]	Liang SONG (宋亮), Xianping WANG (王先平), Le WANG (王乐), Ying ZHANG (张营), Wang LIU (刘旺), Weibing JIANG (蒋卫斌), Tao ZHANG (张涛), Qianfeng FANG (方前锋), Changsong LIU (刘长松). Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique[J]. Plasma Science and Technology, 2017, 19(4): 45502-045502. DOI: 10.1088/2058-6272/aa57f0
[5]	MIAO Chunguang (苗春光), WANG Xiangqin (王相勤). Mass Deposition, Etching and Sputtering Effects of Low-Energy N ⁺ Ion Irradiation on Solid Fly Ash[J]. Plasma Science and Technology, 2013, 15(12): 1232-1236. DOI: 10.1088/1009-0630/15/12/13
[6]	HUANG Fupei (黄福培), YANG Chicheng (杨麒正), YE Chao (叶超), GE Shuibing (葛水兵), et al.. Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering[J]. Plasma Science and Technology, 2013, 15(12): 1197-1203. DOI: 10.1088/1009-0630/15/12/07
[7]	Umm-i-KALSOOM, R. AHMAD, Nisar ALI, I. A. KHAN, Sehrish SALEEM, Uzma IKHLAQ, et al. Effect of Power and Nitrogen Content on the Deposition of CrN Films by Using Pulsed DC Magnetron Sputtering Plasma[J]. Plasma Science and Technology, 2013, 15(7): 666-672. DOI: 10.1088/1009-0630/15/7/12
[8]	PANG Jianhua (庞见华), LU Wenqi (陆文琪), XIN Yu (辛煜), WANG Hanghang (王行行), HE Jia (贺佳), XU Jun (徐军). Plasma Diagnosis for Microwave ECR Plasma Enhanced Sputtering Deposition of DLC Films[J]. Plasma Science and Technology, 2012, 14(2): 172-176. DOI: 10.1088/1009-0630/14/2/17
[9]	MU Zongxin (牟宗信), WANG Chun (王春), MU Xiaodong (牟晓东), JIA Li (贾莉), LIU Shengguang (刘升光), DONG Chuang(董闯). Experimental Study of the Effect of Applied Magnetic Field on Plasma Properties of Unbalanced Magnetron Sputtering[J]. Plasma Science and Technology, 2010, 12(5): 571-576.
[10]	RU Lili (汝丽丽), HUANG Jianjun (黄建军), GAO Liang (高亮), QI Bing (齐冰). Influence of Microwave Power on the Properties of Hydrogenated Diamond-Like Carbon Films Prepared by ECR Plasma Enhanced DC Magnetron Sputtering[J]. Plasma Science and Technology, 2010, 12(5): 551-555.