Numerical Investigation of Flow Fields in Inductively Coupled Plasma Wind Tunnel

YU Minghao(喻明浩); Yusuke TAKAHASHI; Hisashi KIHARA; Ken-ichi ABE; Kazuhiko YAMADA; Takashi ABE

doi:10.1088/1009-0630/16/10/06

Plasma Science and Technology > 2014 > 16(10): 930-940. > DOI: 10.1088/1009-0630/16/10/06

YU Minghao(喻明浩), Yusuke TAKAHASHI, Hisashi KIHARA, Ken-ichi ABE, Kazuhiko YAMADA, Takashi ABE. Numerical Investigation of Flow Fields in Inductively Coupled Plasma Wind Tunnel[J]. Plasma Science and Technology, 2014, 16(10): 930-940. DOI: 10.1088/1009-0630/16/10/06

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Numerical Investigation of Flow Fields in Inductively Coupled Plasma Wind Tunnel

1 Department of Aeronautics and Astronautics, Kyushu University, Fukuoka 819-0395, Japan 2 Division of Mechanical and Space Engineering, Hokkaido University, Sapporo 060-8628, Japan 3 Institute of Space and Astronautical Science, Japan Aerospace Exploration Agency, Sagamihara 252-5210, Japan

Funds: supported by Grant-in-Aid for Scientific Research (No. 23560954), sponsored by the Japan Society for the Promotion of Science

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Received Date: November 17, 2013

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Abstract

Abstract

Numerical simulations of 10 kW and 110 kW inductively coupled plasma (ICP) wind tunnels were carried out to study physical properties of the flow inside the ICP torch and vacuum chamber with air as the working gas. Two-dimensional compressible axisymmetric Navier- Stokes (N-S) equations that took into account 11 species and 49 chemical reactions of air, were solved. A heat source model was used to describe the heating phenomenon instead of solving the electromagnetic equations. In the vacuum chamber, a four-temperature model was coupled with N-S equations. Numerical results for the 10 kW ICP wind tunnel are presented and discussed in detail as a representative case. It was found that the plasma flow in the vacuum chamber tended to be in local thermochemical equilibrium. To study the influence of operation conditions on the flow field, simulations were carried out for different chamber pressures and/or input powers. The computational results for the above two ICP wind tunnels were compared with corresponding experimental data. The computational and experimental results agree well, therefore the flow fields of ICP wind tunnels can be clearly understood.
- inductively coupled plasma,
- Joule heating,
- vacuum chamber,
- chemical reactions

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References (38)

References

1 Bonulos M I. 1985, Pure Appl. Chem., 57: 1321

2 Bernardi D, Colomobo V, Ghedini E, et al. 2003, Eur. Phys. J. D, 28: 423

3 Cheng J, Zhu Y, Ji L H. 2012, Plasma Sci. Technol.,14: 1059

4 Yu B W, Girshick S L. 1991, J. Appl. Phys., 69: 656

5 Barnes R M, Nikdel S. 1976, J. Appl. Phys., 47: 3929

6 Tinck S, Bogaerts A. 2011, Plasma Sources Sci. Technol., 20: 5008

7 Lenzner S, Auweter-Kurtz M, Heiermant J, et al. 2000, J. Thermophys. Heat Tr., 14: 388

8 Vasil'evskii S A, Kolesnikov A F. 2000, Fluid Dynamics, 35: 769

9 Punjabi S B, Joshi N K, Mangalvedekar H A, et al. 2012, Phys. Plasmas, 19: 012108

10 Degrez G, Vanden Abeele D, Barbante P, et al. 2004,Int. J. Numer. Method H., 14: 538

11 Sumi T, Fujita K, Kurotaki T, et al. 2005, Trans.Japan Soc. Aero. Space Sci., 48: 40

12 Suzuki T, Fujita K, Sakai T. 2010, J. Thermophys. Heat Tr., 24: 589

13 Hirata N, Kanzaka T, Takahashi Y, et al. 2012, Comput. Therm. Sci., 4: 225

14 Vanden Abeele D, Degrez G. 2000, AIAA J., 38: 234

15 Takahashi Y, Kihara H, Abe K. 2010, J. Thermophys. Heat Tr., 24: 31

16 Takahashi Y, Kihara H, Abe K. 2011, J. Phys. D: Appl. Phys., 44: 085203

17 Park C. 1990, Nonequilibrium Hypersonic Aerother-modynamics. Wiley, New York

18 Gupta R, Yos J, Thompson R, et al. 1990,A review of reaction rates and thermodynamic and transport properties for an 11-species air model for chemical and thermal nonequilibrium calculations to 30000 K. NASA Reference Publication 1232, National Aeronautics and Space Administration, Washington, USA

19 Silvester P. 1964, Modern Electromagnetic fields, Prentice-Hall, New Jersey

20 Xue S, Proulx P, Boulos M I. 2001, J Phys. D: Appl.Phys., 34: 1897

21 Tanaka Y. 2009, Thin Solid Films, 518: 936

22 Chen X. 1990, Int. J. Heat Mass Tran., 33: 815

23 Fujita K, Mizuno M, Ishida K, et al. 2008, J. Thermophys. Heat Tr., 22: 685

24 Reed T B. 1961, J. Appl. Phys., 32: 821

25 Fujita K, Mizuno M, Ishida K, et al. 2004, Spectroscopic measurement of ICP-heated wind tunnel plasma. 37th AIAA Thermophysics Conference, Portland, Oregon

26 Park C. 1988, J. Thermophys. Heat Tr., 2: 8

27 Yos J M. 1963, Transport properties of nitrogen, hydrogen oxygen and air to 30,000 K. TRAD-TM-63-7, Research and Advanced Development Division, AVCO Corp.28 Fertig M, Dohr A, Fr?uhaufu H H. 1998, Transport coeffcients for high-temperature nonequilibrium air flows. 7th AIAA/ASME Joint Thermophysics and Heat Transfer, Albuquerque, USA

29 Fertig M, Dohr A, Frühaufu H H. 2001, J. Thermophys. Heat Tr., 15: 148

30 Curtiss C F, Hirschfelder J O. 1949, J. Chem. Phys., 17: 550

31 Shima E, Kitamaru K. 2011, AIAA J., 49: 1693

32 Kitamaru K, Shima E, Fujimoto K, et al. 2011, Commun. Comput. Phys., 10: 90

33 Leer B V. 1979, J. Comput. Phys., 32: 101

34 Bussing T R A, Murman E M. 1988, AIAA J., 26: 1070

35 Jameson A, Yoon S. 1987, AIAA J., 25: 929

36 Blazek J. 2001, Computational Fluid Dynamics: Principles and Applications. Elservier, Baden-Daettwil, Switzerland

37 Yamada K, Maeno H, Miyatani S, et al. 2013, The development of 10 kW and '75 mm large diameter ICP heater. Symposium on Flight Mechanics and Astrodynamics, Kanagawa, Japan

38 Ito T, Ishida K, Mizuno M, et al. 2003, 110 kW new high enthalpy wind tunnel heated by inductively coupled plasma. 12th AIAA International Space Planes and Hypersonic Systems and Technologies, Norfolk, Virginia

39 Suzuki T, Fujita K, Ando K, et al. 2008, J. Thermophys. Heat Tr., 22: 382

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