Numerical investigation of Ar–NH<sub>3</sub> mixture in homogenous DBDs

Barkahoum LAROUCI; Soumia BENDELLA; Ahmed BELASRI

doi:10.1088/2058-6272/aaa540

Plasma Science and Technology > 2018 > 20(3): 35403-035403. > DOI: 10.1088/2058-6272/aaa540

Barkahoum LAROUCI, Soumia BENDELLA, Ahmed BELASRI. Numerical investigation of Ar–NH₃ mixture in homogenous DBDs[J]. Plasma Science and Technology, 2018, 20(3): 35403-035403. DOI: 10.1088/2058-6272/aaa540

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Numerical investigation of Ar–NH₃ mixture in homogenous DBDs

Laboratoire de Physique des Plasmas Matériaux Conducteurs et leurs Applications, Faculté de Physique, Université des Sciences et de la Technologie d’Oran Mohamed Boudiaf USTO-MB, El M’Naoeur, B.P. 1505, 31 000 Oran, Algeria

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Received Date: October 18, 2017

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Abstract

Abstract

In this paper, a study of homogenous dielectric barrier discharge Ar–NH₃ was made in order to investigate the electrical and the physical characteristics of homogenous discharge at atmospheric pressure. The discharge model includes the electrical module and the chemical kinetic module. The results obtained by the present model were compared with experimental work. The evolution of the plasmas voltage, the species densities, and the concentration of charged species are analyzed and discussed.
- plasma simulation,
- dielectric barrier discharge,
- Ar–NH₃mixture

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[1]	Kogelschatz U 2003 Plasma Chem. Plasma Process. 23 1
[2]	Belasri A and Harrache Z 2010 Phys. Plasmas 17 123501
[3]	Kogelschatz U 2000 Physics and applications of dielectric-barrier discharges IEEE Conf. Record—Abstracts. Proc. 27th IEEE Int. Conf. on Plasma Science 2000 (New Orleans, LA: IEEE) p81
[4]	Kogelschatz U, Eliasson B and Egli W 1997 J. Physique IV 7 C4–47
[5]	Kanazawa S et al 1988 J. Phys. D: Appl. Phys. 21 838
[6]	Massines F et al 1992 Experimental study of an atmospheric pressure glow discharge. Application to polymers surface treatment Proc. 10th Int. Conf. on Gas Discharges and Their Applications (Swansea, UK: Heriot-Watt University) p 730
[7]	Ceiler M F Jr, Kohl P A and Bidstrup S A 1995 J. Electrochem. Soc. 142 2067
[8]	Ikeda K and Maeda M 1996 Japan. J. Appl. Phys. 35 1573
[9]	Wagner H E et al 2003 Vacuum 71 417
[10]	?tefe?ka M et al 2001 Sci. Technol. Adv. Mater. 2 587
[11]	Meyer C et al 2013 Anal. Bioanal. Chem. 405 4729
[12]	Bazinette R et al 2016 Plasma Process. Polym. 13 1015
[13]	Massines F et al 2005 Plasma Phys. Control. Fusion 47 B577
[14]	Golubovskii Y B et al 2003 J. Phys. D: Appl. Phys. 36 975
[15]	Trunec D, Brablec A and Buchta J 2001 J. Phys. D: Appl. Phys. 34 1697
[16]	Tepper J and Lindmayer M 2000 Investigations on two different kinds of homogeneous barrier discharges at atmospheric pressure Proc. 7th Int. Symp. on High Pressure Low Temperature Plasma Chemistry (Greifswald, 2000) ed H E Wagner p 28
[17]	Ségur P and Massines F 2000 The role of numerical modeling to understand the behavior and to predict the existence of an atmospheric pressure glow discharge controlled by a dielectric barrier Proc. 13th Int. Conf. on Gas Discharges and Their Applications 2000(Glasgow, UK: University of Strathclyde) p15
[18]	Okazaki S et al 1993 J. Phys. D: Appl. Phys. 26 889
[19]	Zhang Z H et al 2013 High Voltage Eng. 39 2254
[20]	Li Z, Zhao Z and Li X H 2012 Phys. Plasmas 19 033510
[21]	Chang Z S et al 2016 Phys. Plasmas 23 093503
[22]	Massines F et al 1998 J. Appl. Phys. 83 2950
[23]	Massines F et al 2003 Surf. Coat. Technol. 174–175 8
[24]	Bendella S and Belasri A 2007 Plasma Dev. Oper. 15 77
[25]	Baadj S, Harrache Z and Belasri A 2013 Plasma Phys. Rep. 39 1043
[26]	Gulati P et al 2012 IEEE Trans. Plasma Sci. 40 2699
[27]	Enache I et al 2007 Plasma Process. Polym. 4 806
[28]	Luo H Y et al 2010 J. Phys. D: Appl. Phys. 43 155201
[29]	Bazinette R et al 2014 Plasma Sources Sci. Technol. 23 035008
[30]	Bazinette R et al 2015 Excitation of dielectric barrier discharge using sinusoidal and nanosecond waveform: application to silicon solar cell Proc. 22nd Int. Symp. on Plasma Chemistry (Antwerp, Belgium: University of Antwerp)
[31]	Vallade J et al 2014 J. Phys. D: Appl. Phys. 47 224006
[32]	Vallade J and Massines F 2013 J. Phys. D: Appl. Phys. 46 464007
[33]	Sonnenfeld A et al 2001 Plasmas Polym. 6 237
[34]	Majumdar A, Schr?der K and Hippler R 2008 J. Appl. Phys. 104 074702
[35]	Gear C W 1971 Numerical Initial Value Problems in Ordinary Differential Equations (Englewood Cliffs, New Jersey: Prentice-Hall, Inc.)
[36]	BOLSIG, KINEMA Software, PO Box 1147, 236 N. Washington St. Monument, CO 80132. http://Bolsig. laplace.univ-tlse.fr
[37]	Arakoni R A, Bhoj A N and Kushner M J 2007 J. Phys. D: Appl. Phys. 40 2476
[38]	Henck R and Voltz R 1968 J. Physique 29 149
[39]	Bogaerts A and Gijbels R 2000 J. Anal. At. Spectrom. 15 441
[40]	Mao M and Bogaerts A 2010 J. Phys. D: Appl. Phys. 43 205201
[41]	Pal U N et al 2013 Plasma Sci. Technol. 15 635

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Numerical investigation of Ar–NH₃ mixture in homogenous DBDs