Hybrid Simulation of Duty Cycle Influences on Pulse Modulated RF SiH4/Ar Discharge

WANG Xifeng (王喜凤); SONG Yuanhong (宋远红); ZHAO Shuxia (赵书霞); DAI Zhongling (戴忠玲); WANG Younian (王友年)

doi:10.1088/1009-0630/18/4/11

Plasma Science and Technology > 2016 > 18(4): 394-399. > DOI: 10.1088/1009-0630/18/4/11

WANG Xifeng (王喜凤), SONG Yuanhong (宋远红), ZHAO Shuxia (赵书霞), DAI Zhongling (戴忠玲), WANG Younian (王友年). Hybrid Simulation of Duty Cycle Influences on Pulse Modulated RF SiH4/Ar Discharge[J]. Plasma Science and Technology, 2016, 18(4): 394-399. DOI: 10.1088/1009-0630/18/4/11

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Hybrid Simulation of Duty Cycle Influences on Pulse Modulated RF SiH4/Ar Discharge

School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China

Funds: supported by National Natural Science Foundation of China (No. 11275038)

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Received Date: August 30, 2015

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Abstract

Abstract

A one-dimensional fluid/Monte-Carlo (MC) hybrid model is developed to describe capacitively coupled SiH4/Ar discharge, in which the lower electrode is applied by a RF source and pulse modulated by a square-wave, to investigate the modulation effects of the pulse duty cycle on the discharge mechanism. An electron Monte Carlo simulation is used to calculate the electron energy distribution as a function of position and time phase. Rate coefficients in chemical reactions can then be obtained and transferred to the fluid model for the calculation of electron temperature and densities of different species, such as electrons, ions, and radicals. The simulation results show that, the electron energy distribution f(ε) is modulated evidently within a pulse cycle, with its ?tail extending to higher energies during the power-on period, while shrinking back promptly in the afterglow period. Thus, the rate coe?cients could be controlled during the discharge, resulting in modulation of the species composition on the substrate compared with continuous excitation. Meanwhile, more negative ions, like SiHand SiH2, may escape to the electrodes owing to the collapse of ambipolar electric fields, which is bene?cial to films deposition. Pulse modulation is thus expected to provide additional methods to customize the plasma densities and components.
- hybrid model,
- EEDF,
- pulse modulation,
- SiH4/Ar mixture

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References

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