Non-thermal plasma treatment as a new biotechnology in relation to seeds, dry fruits, and grains

Bozena ŠERÁ; Michal ŠERÝ

doi:10.1088/2058-6272/aaacc6

Plasma Science and Technology > 2018 > 20(4): 44012-044012. > DOI: 10.1088/2058-6272/aaacc6

Bozena ŠERÁ, Michal ŠERÝ. Non-thermal plasma treatment as a new biotechnology in relation to seeds, dry fruits, and grains[J]. Plasma Science and Technology, 2018, 20(4): 44012-044012. DOI: 10.1088/2058-6272/aaacc6

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Non-thermal plasma treatment as a new biotechnology in relation to seeds, dry fruits, and grains

Bozena ŠERÁ^1,2,
Michal ŠERÝ³

1 Comenius University in Bratislava, Faculty of Natural Sciences, Department of Landscape Ecology, Ilkovicova 6, Bratislava 842 48, Slovakia 2 University of South Bohemia, Faculty of Education, Department of Biology, Jeronymova 10, Ceské Budějovice, Czechia 3 University of South Bohemia, Faculty of Education, Department of Applied Physics and Technics, Jeronymova 10, Ceské Budějovice, Czechia

Funds: This work is supported by the Slovak Grant Agency for Science (Grant No. VEGA 1/0628/15) and by the Slovak Research and Development Agency (Grant No. ERDF SPECTRA+?20240120002).

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Received Date: October 06, 2017

Graphical Abstract

Abstract

Abstract

Non-thermal plasma (NTP) technology offers wide potential use in the food technology, the same as in the unconventional agriculture. Some seeds, dry fruits, grains and their sprouts gain popularity in the culinary industry as ‘raw seeds’. This review paper draws the current research and trends in NTP pre-treatment of selected seeds/fruits that are useable as ‘raw seeds’. The main applications are connected with activation of seed germination, early growth of seedlings, microbial inactivation of seed/fruit surface, and possibility of increasing quantity of biological active compounds in sprouting seeds. The paper presents a list of plant species that are able to be used as ‘raw seed’ including current information about main type of NTP treatment implemented.
- biotechnology,
- early growth,
- plasma technology,
- low-pressure discharge,
- microbiological inactivation,
- seed modification

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References (52)

References

[1]	Liu R H 2013 J. Food Sci. 78 A18
[2]	Liu R H 2013 Adv. Nutrition 4 384S
[3]	Slavin J 2004 Nutrition Res. Rev. 17 99
[4]	Hall C, Hillen C and Robinson J G 2017 Cereal Chem. 94 11
[5]	Grosso G and Estruch R 2016 Maturitas 84 11
[6]	Cunnane S C et al 1993 Br. J. Nutrition 69 443
[7]	Shetty K 2004 Process Biochem. 39 789
[8]	Nikmaram N et al 2017 Food Control 79 62
[9]	Vidrih R, Filip S and Hribar J 2009 Czech J. Food Sci. 27 S125
[10]	Martinez-Villaluenga C et al 2010 Food Chem. 120 710
[11]	Fernandez-Orozco R et al 2008 Food Chem. 111 622
[12]	Aguilera Y, Herrera T and Benitez V 2015 Food Chem. 170 203
[13]	Cevallos-Cevallos J M et al 2012 Int. J. Food Microbiol. 158 140
[14]	Olaimat A N and Holley R A 2012 Food Microbiol. 32 1
[15]	Ziuzina D et al 2014 Food Microbiol. 42 109
[16]	Scholtz V et al 2015 Biotechnol. Adv. 33 1108
[17]	Pankaj S K and Keener K M 2017 Curr. Opin. Food Sci. 16 49
[18]	Randeniya L K and de Groot G J J B 2015 Plasma Process. Polym. 12 608
[19]	Conrads H and Schmidt M 2000 Plasma Sources Sci. Technol. 9 441
[20]	Veprek S and Venugopalan M 1983 Topics in Current Chemistry: Plasma Chemistry IV (New York: Springer)
[21]	Liu C J et al 2006 Pure Appl. Chem. 78 1227
[22]	Sankar P et al 2017 J. Anal. At. Specrometry 32 1177
[23]	Moreau M, Orange N and Feuilloley M G J 2008 Biotechnol. Adv. 26 610
[24]	Cheruthazhekatt S et al 2010 J. Appl. Biomed. 8 55
[25]	Pankaj S K et al 2014 Trends Food Sci. Technol. 35 5
[26]	Lerouge S, Wertheimer M R and Yahia L H 2001 Plasmas Polym. 6 175
[27]	Fridman G et al 2008 Plasma Process. Polym. 5 503
[28]	Mraz I et al 2014 J. Plant Pathology 96 1
[29]	Baier M et al 2014 Innovative Food Sci. Emerg. Technol. 22 147
[30]	Selcuk M, Oksuz L and Basaran P 2008 Bioresour. Technol. 99 5104
[31]	Dasan B G, Boyaci I H and Mutlu M 2016 Food Control 70 1
[32]	Wang G M et al 2016 Vaccine 34 1126
[33]	Mitra A et al 2014 Food Bioprocess Technol. 7 645
[34]	Zahoranova A et al 2015 Plasma Chem. Plasma Process. 36 397
[35]	Basaran P, Basaran-Akgul N and Oksuz L 2008 Food Microbiol. 25 626
[36]	Filatova I I et al 2014 J. Appl. Spectrosc. 81 250
[37]	Butscher D et al 2016 Int. J. Food Microbiol. 238 222
[38]	Solis-Fernandez P et al 2010 J. Colloid Interface Sci. 344 451
[39]	Kvam E et al 2012 Antimicrobial Agents Chemother. 56 2028
[40]	Volin J C et al 2000 Crop Sci. 40 1706
[41]	Zivkovic N et al 2004 Seed Sci. Technol. 32 693
[42]	Azharonok V V et al 2011 SPSA Paper vol 2011, p 93
[43]	Filatova I et al 2011 Rom. J. Phys. 56 139
[44]	Tang X et al 2016 CCTA Paper 2016-522
[45]	Dubinov A E, Lazarenko E M and Selemir V D 2000 IEEE Trans. Plasma Sci. 1 180
[46]	Brasoveanu M et al 2015 Rom. Rep. Phys. 67 617
[47]	Gavril B et al 2011 SPSA Paper 2011-189
[48]	Bormashenko E et al 2015 J. Exp. Bot. 66 4013
[49]	Bormashenko E et al 2012 Sci. Rep. 2 741
[50]	Kim J W, Puligundla P and Mok C 2017 J. Sci. Food Agric. 97 128
[51]	Dubinov A E, Kozhayeva J P and Zuimatch E A 2017 IEEE Trans. Plasma Sci. 45 294
[52]	Sera B et al 2012 OPTIM Paper 2012-1365

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