Evaluation of electron cyclotron current drive performance for CFETR

Wei WEI (韦维); Xiaojie WANG (王晓洁); Miaohui LI (李妙辉); Bojiang DING (丁伯江)

doi:10.1088/2058-6272/ab0841

Plasma Science and Technology > 2019 > 21(6): 65101-065101. > DOI: 10.1088/2058-6272/ab0841

Wei WEI (韦维), Xiaojie WANG (王晓洁), Miaohui LI (李妙辉), Bojiang DING (丁伯江). Evaluation of electron cyclotron current drive performance for CFETR[J]. Plasma Science and Technology, 2019, 21(6): 65101-065101. DOI: 10.1088/2058-6272/ab0841

Citation:

PDF (2173 KB)

Evaluation of electron cyclotron current drive performance for CFETR

¹ Hefei University of Technology, Hefei 230601, People’s Republic of China
² Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People’s Republic of China

Funds: This work is supported by National Key R&D Program of China (Nos. 2016YFA0400600, 2016YFA0400602, 2016YFA0400603, 2017YFE0300500 and 2017YFE0300503), the National Magnetic Confinement Fusion Science Program of China (No. 2015GB102003), and the National Natural Science Foundation of China (Nos. 11675214, 11775259).

More Information

Received Date: September 02, 2018

Graphical Abstract

Abstract

Abstract

A number of simulations of electron cyclotron current drive (ECCD) have been carried out for the China Fusion Engineering Test Reactor (CFETR) using the C3PO/LUKE code to investigate the performance and optimize schemes of power injection for the design of the launcher. The operation ranges of the toroidal field, cutoff density, and resonance layer location are given at different source frequencies in CFETR phases I and II. A comparison of ECCD performance between the horizontal and top port launch is presented. ECCD efficiency (r_EC) estimated for CFETR phase I is r_EC=0.21 for top port launch and r_EC=0.20 for horizontal port launch. The ECCD efficiency and second-harmonic absorption is calculated at different wave frequencies (from 170 to 230 GHz) in CFETR phase II. It is found that the highest driven efficiency is obtained at 210 GHz with the toroidal field of 6.5 T, and the second-harmonic absorption increases rapidly with the increase of frequency.
- CFET,
- electron cyclotron current drive,
- current drive efficiency

FullText(HTML)

References (25)

References

[1]	Wan Y X et al 2017 Nucl. Fusion 57 102009
[2]	Chen J L et al 2017 Plasma Phys. Control. Fusion 59 075005
[3]	Shi N et al 2016 Fusion Eng. Des. 112 47
[4]	Chan V S et al 2015 Nucl. Fusion 55 023017
[5]	Figini L et al 2015 Plasma Phys. Control. Fusion 57 054015
[6]	Farina D et al 2014 Phys. Plasmas 21 061504
[7]	Farina D et al 2012 Nucl. Fusion 52 033005
[8]	La Haye R J, Isayama A and Maraschek M 2009 Nucl. Fusion 49 045005
[9]	Wenninger R et al 2015 Nucl. Fusion 55 063003
[10]	Shi B R 1999 Magnetic Confinement Fusion (Beijing: Atomic Energy Press) (in Chinese)
[11]	Decker J and Peysson Y 2004 DKE: a Fast Numerical Solver for the 3D Relativistic Bounce-Averaged Electron Drift Kinetic Equation EUR-CEA-FC-1736 (Cambridge, MA: Plasma Science and Fusion Center)
[12]	Karney C F F 1986 Comput. Phys. Rep. 4 183
[13]	Petty C C et al 2003 Nucl. Fusion 43 700
[14]	Poli E et al 2013 Nucl. Fusion 53 013011
[15]	Ramponi G et al 2008 Nucl. Fusion 48 054012
[16]	Garcia J et al 2008 Nucl. Fusion 48 075007
[17]	Garofalo A M et al 2014 Nucl. Fusion 54 073015
[18]	Erckmann V and Gasparino U 1994 Plasma Phys. Control. Fusion 36 1869
[19]	Nowak S et al 2014 Nucl. Fusion 54 033003
[20]	Lu W et al 2013 Chin. Phys. Lett. 30 065203
[21]	Maraschek M 2012 Nucl. Fusion 52 074007
[22]	Wehner W and Schuster E 2012 Nucl. Fusion 52 074003
[23]	Mikkelsen D R et al 2018 Nucl. Fusion 58 036014
[24]	Wei W et al 2014 Chin. Phys. B 23 055201
[25]	Wei W et al 2016 Chin. Phys. B 25 015201

[1]	Min ZHU (朱敏), Chao YE (叶超), Xiangying WANG (王响英), Amin JIANG (蒋阿敏), Su ZHANG (张苏). Effect of radio-frequency substrate bias on ion properties and sputtering behavior of 2 MHz magnetron sputtering[J]. Plasma Science and Technology, 2019, 21(1): 15507-015507. DOI: 10.1088/2058-6272/aae7dd
[2]	Amin JIANG (蒋阿敏), Chao YE (叶超), Xiangying WANG (王响英), Min ZHU (朱敏), Su ZHANG (张苏). Ion property and electrical characteristics of 60 MHz very-high-frequency magnetron discharge at low pressure[J]. Plasma Science and Technology, 2018, 20(10): 105401. DOI: 10.1088/2058-6272/aad379
[3]	Jiamin GUO (郭佳敏), Chao YE (叶超), Xiangying WANG (王响英), Peifang YANG (杨培芳), Su ZHANG (张苏). Growth and structural properties of silicon on Ag films prepared by 40.68 MHz veryhigh-frequency magnetron sputtering[J]. Plasma Science and Technology, 2017, 19(7): 75502-075502. DOI: 10.1088/2058-6272/aa6395
[4]	Liang SONG (宋亮), Xianping WANG (王先平), Le WANG (王乐), Ying ZHANG (张营), Wang LIU (刘旺), Weibing JIANG (蒋卫斌), Tao ZHANG (张涛), Qianfeng FANG (方前锋), Changsong LIU (刘长松). Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique[J]. Plasma Science and Technology, 2017, 19(4): 45502-045502. DOI: 10.1088/2058-6272/aa57f0
[5]	LIU Yi (刘毅), YE Chao (叶超), HE Haijie (何海杰), WANG Xiangying (王响英). Effect of Frequency and Power of Bias Applied to Substrate on Plasma Property of Very-High-Frequency Magnetron Sputtering[J]. Plasma Science and Technology, 2015, 17(7): 583-588. DOI: 10.1088/1009-0630/17/7/10
[6]	WANG Qing (王庆), YUE Xiangji (岳向吉), BA Dechun (巴德纯), ZHANG Yichen (张以忱), et al.. Influence of Hysteretic Behaviour in Reactive Magnetron Sputtering on the Crystal Structure and Characteristics of Aluminium Oxide Films[J]. Plasma Science and Technology, 2013, 15(8): 807-811. DOI: 10.1088/1009-0630/15/8/17
[7]	Umm-i-KALSOOM, R. AHMAD, Nisar ALI, I. A. KHAN, Sehrish SALEEM, Uzma IKHLAQ, et al. Effect of Power and Nitrogen Content on the Deposition of CrN Films by Using Pulsed DC Magnetron Sputtering Plasma[J]. Plasma Science and Technology, 2013, 15(7): 666-672. DOI: 10.1088/1009-0630/15/7/12
[8]	MU Zongxin, LIU Shengguang, ZANG Hairong, WANG Chun, MU Xiaodong. Discharge Properties of High-Power Pulsed Unbalanced Magnetron Sputtering[J]. Plasma Science and Technology, 2011, 13(6): 667-671.
[9]	MU Zongxin (牟宗信), WANG Chun (王春), MU Xiaodong (牟晓东), JIA Li (贾莉), LIU Shengguang (刘升光), DONG Chuang(董闯). Experimental Study of the Effect of Applied Magnetic Field on Plasma Properties of Unbalanced Magnetron Sputtering[J]. Plasma Science and Technology, 2010, 12(5): 571-576.
[10]	RU Lili (汝丽丽), HUANG Jianjun (黄建军), GAO Liang (高亮), QI Bing (齐冰). Influence of Microwave Power on the Properties of Hydrogenated Diamond-Like Carbon Films Prepared by ECR Plasma Enhanced DC Magnetron Sputtering[J]. Plasma Science and Technology, 2010, 12(5): 551-555.