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WANG Xiaomin(王晓敏), YUAN Qianghua(袁强华), ZHOU Yongjie(周永杰), YIN Guiqin(殷桂琴), DONG Chenzhong(董晨钟). Deposition of Polymer Thin Film Using an Atmospheric Pressure Micro-Plasma Driven by Dual-Frequency Excitation[J]. Plasma Science and Technology, 2014, 16(1): 68-72. DOI: 10.1088/1009-0630/16/1/15
Citation: WANG Xiaomin(王晓敏), YUAN Qianghua(袁强华), ZHOU Yongjie(周永杰), YIN Guiqin(殷桂琴), DONG Chenzhong(董晨钟). Deposition of Polymer Thin Film Using an Atmospheric Pressure Micro-Plasma Driven by Dual-Frequency Excitation[J]. Plasma Science and Technology, 2014, 16(1): 68-72. DOI: 10.1088/1009-0630/16/1/15

Deposition of Polymer Thin Film Using an Atmospheric Pressure Micro-Plasma Driven by Dual-Frequency Excitation

Funds: supported by National Natural Science Foundation of China (No.11165012), China Postdoctoral Science Foundation Funded Project (2011M501494, 2012T50831), Project of Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province, Project of Northwest Normal University (NWNU-LKQN-11-9)
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  • Received Date: August 21, 2013
  • Polymer thin film deposition using an atmospheric pressure micro-plasma jet driven by dual-frequency excitations is described in this paper. The discharge process was operated with a mixture of argon (6 slm) and a small amount of acetone (0-2100 ppm). Plasma composition was measured by optical emission spectroscopy (OES). In addition to a large number of Ar spectra lines, we observed some spectra of C, CN, CH and C 2 . Through changing acetone content mixed in argon, we found that the optimum discharge condition for deposition can be characterized by the maximum concentration of carbonaceous species. The deposited film was characterized by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared (FTIR) spectroscopy. The XPS indicated that the film was mostly composed of C with trace amount of O and N elements. The FTIR suggested different carbon-containing bonds (-CH x, C=O, C=C, C-O-C) presented in the deposited film.
  • 1 Yasuda H. 1985, Plasma Polymerization. Academic Press, New York;
    2 Nakanishi K, Muguruma H, Karube I. 1996, Anal.Chem., 68: 1695;
    3 da Silva M L P, Tan I H, Nascimento Filho A P, et al.2003, Sensors and Actuators, B91: 362;
    4 Yu Y J, Kim J G, Cho S H, et al. 2003, Surf. Coat.Technol., 162: 161;
    5 Jiang H, Hong L G, Venkatasubramanian N, et al.2007, Thin Solid Films, 515: 3513;
    6 Cui N Y, Brown N M D. 2002, Applied Surface Sci-ence, 189: 31;
    7 Yi J W, Lee Y H, Farouk B. 2000, Thin Solid Films,374: 103;
    8 Da Cruz N C, Lopes B B, Rangel E C, et al. 2008,Surf. Coat. Technol., 203: 534;
    9 Lopes B B, Davanzo C U, Schreiner W, et al. 2008,Surf. Coat. Technol., 203 : 526;
    10 Chouquet C, Gerbaud G, Bardet M, et al. 2010, Surf.Coat. Technol., 204: 1339;
    11 Kim D B, Moon S Y, Jung H, et al. 2010, Physics of Plasmas, 17: 053508;
    12 Zhou Y J, Yuan Q H, Li F, et al. 2013, Physics of Plasmas, 20: 113502;
    13 Jiang N, Ji A L, Cao Z X. 2009, J. Appl. Phys., 106:013308;
    14 Beier O, Pfuch A, Horn K, et al. 2013, Plasma Process.Polym., 10: 7715 Cheng M L, Tang X L, Chen X L, et al. 2009, The Journal of Light Scattering, 21: 82;
    16 Wertheimer M R, Moisan M. 1985, J. Vac. Sci. Tech-nol., A3: 2643;
    17 Nikiforov A Y, Sarani A, Leys C. 2011, Plasma Sources Sci. Technol., 20: 015014;
    18 Jacob M V, Easton C D, Woods G S, et al. 2008, Thin Solid Films, 516: 3884;
    19 Imanaka H, Khare B N, Elsila J E, et al. 2004, Icarus,168: 344;
    20 Elzein T, Nasser-Eddine M, Delaite C, et al. 2004,Journal of Colloid and Interface Science, 273: 381;
    21 Grant J T, Jiang H, Tullis S, et al. 2005, Vacuum, 80:12
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