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Yanghaichao LIU (刘杨海超), Renxi ZHANG (张仁熙), Huiqi HOU (侯惠奇), Shanping CHEN (陈善平), Ruina ZHANG (张瑞娜). NO reduction using low-temperature SCR assisted by a DBD method[J]. Plasma Science and Technology, 2018, 20(1): 14002-014002. DOI: 10.1088/2058-6272/aa9326
Citation: Yanghaichao LIU (刘杨海超), Renxi ZHANG (张仁熙), Huiqi HOU (侯惠奇), Shanping CHEN (陈善平), Ruina ZHANG (张瑞娜). NO reduction using low-temperature SCR assisted by a DBD method[J]. Plasma Science and Technology, 2018, 20(1): 14002-014002. DOI: 10.1088/2058-6272/aa9326

NO reduction using low-temperature SCR assisted by a DBD method

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  • This paper discusses the removal of nitric oxide (NO) with low-temperature selective catalytic reduction driven by a dielectric barrier discharge with ammonia (NH3) as a reductant. We explored the effects of NH3, O2, temperature and water under different applied voltage on NO removal at atmospheric pressure. The results showed that when the gas concentration ration of NH3/NO was 0.23–0.67, the NO removal efficiency and the energy consumption was acceptable. The NO removal efficiency reached 84% under an applied voltage of 7 kV, 400 ppm NO and 90 ppm NH3 at a temperature of 150 °C. Water vapor had a negative effect because NO formation reactions were strengthened and NH3 was oxidized directly rather than reduced NO molecules. The outlet gas components were observed via Fourier transform infrared spectroscopy for revealing the decomposition process and mechanism.
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