Wakefield Resonant Excitation by Intense Laser Pulse in Capillary Plasma

ZHOU Suyun(周素云); YUAN Xiao(袁孝); LIU Mingping(刘明萍)

doi:10.1088/1009-0630/14/1/01

Plasma Science and Technology > 2012 > 14(1): 1-4. > DOI: 10.1088/1009-0630/14/1/01

ZHOU Suyun(周素云), YUAN Xiao(袁孝), LIU Mingping(刘明萍). Wakefield Resonant Excitation by Intense Laser Pulse in Capillary Plasma[J]. Plasma Science and Technology, 2012, 14(1): 1-4. DOI: 10.1088/1009-0630/14/1/01

Citation:

PDF (1624 KB)

Wakefield Resonant Excitation by Intense Laser Pulse in Capillary Plasma

1 Institute of Communications and electronics, Jiangxi Science and Technology Normal University, Nanchang 330013, China 2 College of Information Engineering, Nanchang University, Nanchang 330031, China

More Information

Received Date: September 12, 2011

Graphical Abstract

Abstract

Abstract

The laser-induced plasma wakefield in a capillary is investigated on the basis of a simple two-dimensional analytical model. It is shown that as an intense laser pulse reshaped by the capillary wall propagates in capillary plasma, it resonantly excites a strong wakefield if a suitable laser pulse width and capillary radius are chosen for a certain plasma density. The dependence of the laser width and capillary radius on the plasma density for resonance conditions is considered. The wakefield amplitude and longitudinal scale of bubbles in capillary plasma are much larger than those in unbounded plasma, so the capillary guided plasma wakefield is more favorable to electron acceleration.
- capillary plasma,
- wakefield plasma resonance

FullText(HTML)

References (0)

[1]	Weiwei XU (徐卫卫), Xiuling ZHANG (张秀玲), Mengyue DONG (董梦悦), Jing ZHAO (赵静), Lanbo DI (底兰波). Plasma-assisted Ru/Zr-MOF catalyst for hydrogenation of CO₂ to methane[J]. Plasma Science and Technology, 2019, 21(4): 44004-044004. DOI: 10.1088/2058-6272/aaf9d2
[2]	Haiying WEI (魏海英), Hongge GUO (郭红革), Lijun SANG (桑利军), Xingcun LI (李兴存), Qiang CHEN (陈强). Study on deposition of Al₂O₃ films by plasma-assisted atomic layer with different plasma sources[J]. Plasma Science and Technology, 2018, 20(6): 65508-065508. DOI: 10.1088/2058-6272/aaacc7
[3]	Vukoman JOKANOVIC, Bozana COLOVIC, Anka TRAJKOVSKA PETKOSKA, Ana MRAKOVIC, Bojan JOKANOVIC, Milos NENADOVIC, Manuela FERRARA, Ilija NASOV. Optical properties of titanium oxide films obtained by cathodic arc plasma deposition[J]. Plasma Science and Technology, 2017, 19(12): 125504. DOI: 10.1088/2058-6272/aa8806
[4]	Jiaojiao LI (李娇娇), Qianghua YUAN (袁强华), Xiaowei CHANG (常小伟), Yong WANG (王勇), Guiqin YIN (殷桂琴), Chenzhong DONG (董晨钟). Deposition of organosilicone thin film from hexamethyldisiloxane (HMDSO) with 50kHz/ 33MHz dual-frequency atmospheric-pressure plasma jet[J]. Plasma Science and Technology, 2017, 19(4): 45505-045505. DOI: 10.1088/2058-6272/aa57e4
[5]	NIU Jinhai(牛金海), ZHANG Zhihui(张志慧), FAN Hongyu(范红玉), YANG Qi(杨杞), LIU Dongping(刘东平), QIU Jieshan(邱介山). Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Films by Dielectric Barrier Discharge in TiCl₄ /O₂ /N ₂Gas Mixtures[J]. Plasma Science and Technology, 2014, 16(7): 695-700. DOI: 10.1088/1009-0630/16/7/11
[6]	ZHOU Yongjie(周永杰), YUAN Qianghua(袁强华), WANG Xiaomin(王晓敏), YIN Guiqin(殷桂琴), DONG Chenzhong(董晨钟). Optical Spectroscopic Investigation of Ar/CH ₃ OH and Ar/N₂ /CH₃ OH Atmospheric Pressure Plasma Jets[J]. Plasma Science and Technology, 2014, 16(2): 99-103. DOI: 10.1088/1009-0630/16/2/03
[7]	WANG Xiaomin(王晓敏), YUAN Qianghua(袁强华), ZHOU Yongjie(周永杰), YIN Guiqin(殷桂琴), DONG Chenzhong(董晨钟). Deposition of Polymer Thin Film Using an Atmospheric Pressure Micro-Plasma Driven by Dual-Frequency Excitation[J]. Plasma Science and Technology, 2014, 16(1): 68-72. DOI: 10.1088/1009-0630/16/1/15
[8]	WU Maoshui(吴茂水), XU Yu(徐雨), DAI Linjun(戴林君), WANG Tiantian(王恬恬), LI Xue(李雪), WANG Dexin(王德信), GUO Ying(郭颖), DING Ke(丁可), HUANG Xiaojiang(黄晓江), SHI Jianjun(石建军), ZHANG Jing(张菁). The Gas Nucleation Process Study of Anatase TiO 2 in Atmospheric Non-Thermal Plasma Enhanced Chemical Vapor Deposition[J]. Plasma Science and Technology, 2014, 16(1): 32-36. DOI: 10.1088/1009-0630/16/1/07
[9]	XIONG Yuqing, SANG Lijun, CHEN Qiang, YANG Lizhen, WANG Zhengduo, LIU Zhongwei. Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films[J]. Plasma Science and Technology, 2013, 15(1): 52-55. DOI: 10.1088/1009-0630/15/1/09
[10]	SUN Yanpeng (孙艳朋), NIE Yong (聂勇), WU Angshan (吴昂山), JI Dengxiang(姬登祥), YU Fengwen (于凤文), JI Jianbing (计建炳. Carbon Dioxide Reforming of Methane to Syngas by Thermal Plasma[J]. Plasma Science and Technology, 2012, 14(3): 252-256. DOI: 10.1088/1009-0630/14/3/12