Characteristics of a Collisional Sheath Biased by a Dual Frequency Source

ZHANG Hong; DAI Zhongling; WANG Younian

Plasma Science and Technology > 2011 > 13(5): 513-518.

ZHANG Hong, DAI Zhongling, WANG Younian. Characteristics of a Collisional Sheath Biased by a Dual Frequency Source[J]. Plasma Science and Technology, 2011, 13(5): 513-518.

Citation:

ZHANG Hong, DAI Zhongling, WANG Younian. Characteristics of a Collisional Sheath Biased by a Dual Frequency Source[J]. Plasma Science and Technology, 2011, 13(5): 513-518.

Citation:

ZHANG Hong, DAI Zhongling, WANG Younian. Characteristics of a Collisional Sheath Biased by a Dual Frequency Source[J]. Plasma Science and Technology, 2011, 13(5): 513-518.

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Characteristics of a Collisional Sheath Biased by a Dual Frequency Source

School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China

Funds: Supported by the National Natural Science Foundation of China (No.10635010 and No.10975030), and the Science Research Foundation of Dalian University of Technology.

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Received Date: December 19, 2010

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Abstract

Abstract

A hybrid model is used to simulate the characteristics of a collisional sheath in a capacitively coupled plasma (CCP) driven by a dual frequency source including a RF and a pulsed current source applied to the same electrode. The hybrid model includes a fluid model used to simulate the characteristics of the collisional sheath, and a Monte-Carlo (MC) method to obtain both ion energy and ion angular distributions (IEDs and IADs) impinging on the substrate. The effect of the low frequency of the pulsed source and the gas pressure on the characteristics of the sheath, as well as the IEDs and IADs, were studied. The results show that the ratio of pulse/RF frequency and the gas pressure are crucial for the characteristics of the sheath and the IEDs. The IADs are significantly more sensitive to the gas pressure.
- collisional sheath,
- pulse and RF,
- hybrid model,
- IED,
- IAD

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