W fuzz layers: very high resistance to sputtering under fusion-relevant He<sup>+</sup> irradiations

Hongyu FAN; Chunjie NIU; Xiaoping LI; Weifeng LIU; Yang ZHANG; Weiyuan NI; Yinghui ZHANG; Lu LIU; Dongping LIU; Günther BENSTETTER; Guangjiu LEI; Jinhai NIU

doi:10.1088/2058-6272/ac35a2

Plasma Science and Technology > 2022 > 24(1): 015601. > DOI: 10.1088/2058-6272/ac35a2

Hongyu FAN, Chunjie NIU, Xiaoping LI, Weifeng LIU, Yang ZHANG, Weiyuan NI, Yinghui ZHANG, Lu LIU, Dongping LIU, Günther BENSTETTER, Guangjiu LEI, Jinhai NIU. W fuzz layers: very high resistance to sputtering under fusion-relevant He⁺ irradiations[J]. Plasma Science and Technology, 2022, 24(1): 015601. DOI: 10.1088/2058-6272/ac35a2

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W fuzz layers: very high resistance to sputtering under fusion-relevant He⁺ irradiations

1.
Liaoning Key Laboratory of Plasma Technology, Dalian Minzu University, Dalian 116600, People's Republic of China
2.
School of Electrical Engineering, Dalian University of Technology, Dalian 116024, People's Republic of China
3.
Department of Physics, Dalian Maritime University, Dalian 116026, People's Republic of China
4.
Xi'an Rare Metal Materials Institute Co., Ltd, Xi'an 710000, People's Republic of China
5.
Faculty of Electrical Engineering and Media Technology, Deggendorf Institute of Technology, Deggendorf D-94469, Germany
6.
Southwestern Institute of Physics, Chengdu 610225, People's Republic of China

More Information

Corresponding author:
Dongping LIU, E-mail: dpliu@dlut.edu.cn

Jinhai NIU, E-mail: niujh@dlnu.edu.cn
Received Date: June 06, 2021
Revised Date: October 31, 2021
Accepted Date: November 01, 2021
Available Online: March 18, 2024
Published Date: December 08, 2021

Graphical Abstract

Abstract

Abstract

In this study, we have modeled the sputtering process of energetic He⁺ ions colliding with W nano-fuzz materials, based on the physical processes, such as the collision and diffusion of energetic particles, sputtering and redeposition. Our modeling shows that the fuzzy nanomaterials with a large surface-to-volume ratio exhibit very high resistance to sputtering under fusion-relevant He⁺ irradiations, and their sputtering yields are mainly determined by the thickness of fuzzy nano-materials, the reflection coefficients and mean free paths of energetic particles, surface sputtering yields of a flat base material, and the geometry of nano-fuzz. Our measurements have confirmed that the surface sputtering yield of a W nano-fuzz layer with the columnar geometry of nano-fuzz in cross-section is about one magnitude of order lower than the one of smooth W substrates. This work provides a complete model for energetic particles colliding with the nano-fuzz layer and clarifies the fundamental sputtering process occurring in the nano-fuzz layer.
- plasma facing materials,
- W nano-fuzz,
- surface sputtering,
- simulation model

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Acknowledgments

This work is supported by the National Key R & D Program of China (No. 2017YFE0300106), National Natural Science Foundation of China (No. 11320101005), Liaoning Provincial Natural Science Foundation (Nos. 20180510006, 2019-ZD-0186), and Natural Science Basis Research Program of Shanxi Province (No. 2020GY-268).

References (36)

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